Mechanical Engineering - Summer Intern

Job Description Job Description Position Summary We are looking for a summer mechanical engineering intern to join the Systems Engineering team to support the design, integration, prototyping, and testing of high precision semiconductor equipment. This position will work with software and application groups to develop and integrate new technology in the area of imprint lithography. Key duties include specification definition, precision machine design, FMEA, FEA, design for manufacturing, prototype assembly and validation testing. Position requires a “hands-on” individual that is familiar with assembling and working with electromechanical and pneumatic systems. Must have excellent root-cause analysis and troubleshooting skills to quickly identify and resolve assembly/build/design issues and generate follow-on ECOs. Candidates must be highly innovative and enjoy working in a dynamic and creative environment within a multidisciplinary team. Essential Functions · Design and develop subsystems for use in semiconductor capital equipment. · Apply engineering analysis including FEA and other methodology · Design for manufacturability and serviceability · Communicate technical details across engineering groups and with vendors on a regular basis. · Assemble and test prototype equipment · Design and execute experiments to verify system and subsystem specifications are met · Error budget analysis & verification of electromechanical, optical, pneumatic, fluid management and vacuum systems · Maintain engineering documentation of system specifications and theory of operation Qualifications Education: BS in Mechanical Engineering or Junior in BSME program Experience: - Hands-on, design, debug, and test of linear and/or rotary stages, pneumatic regulators and solenoids, optical or capacitive sensors in electromechanical systems - Solid root cause analysis - Proven experimental design and statistical analysis - Integration of pneumatic, vacuum, capacitive, optical sensors - Proficient in NX or other 3D CAD system - MatLab or Octave experience a plus - MS Word, MS Excel, MS Powerpoint required Further Details · Locate in Austin Texas is preferred. · Position reports to the Sr. Director of Systems Engineering of Canon Nanotechnologies Physical Demands/Work Environment Position requires continuous physical effort; intermittent and long-term work cycles; standing, walking, sitting, repetitive motion, and lifting up to 25 pounds unassisted. Lifting more than 25 lbs requires additional help. Employee may be required to work at a computer terminal for long periods of time. Employee will be able to hear and understand speech at normal levels and on the telephone. Position requires effective communication skills, verbal and written form. Mental alertness is a must. Employee may be exposed to atmospheric conditions, such as: dust, fumes, noise and varying temperatures. Employee is required to demonstrate continued knowledge of Haz/Com regulations and requirements. Must be able to work in a cleanroom environment, this includes wearing protective clothing. Domestic and International travel may be required . Company Description Canon Nanotechnologies located in Austin, Texas was formed when Canon acquired the Molecular Imprints’ semiconductor business unit in 2014. Canon Nanotechnologies, together with Canon, is the market and technology leader for high-resolution, low cost-of-ownership nanoimprint lithography systems and solutions for the semiconductor industry. Canon Nanotechnologies systems feature its innovative Jet and Flash Imprint Lithography (J-FIL) technology to help create the sub-20nm required in today’s state-of-the-art semiconductor memory devices. (http://cnt.canon.com) Company Description Canon Nanotechnologies located in Austin, Texas was formed when Canon acquired the Molecular Imprints’ semiconductor business unit in 2014. Canon Nanotechnologies, together with Canon, is the market and technology leader for high-resolution, low cost-of-ownership nanoimprint lithography systems and solutions for the semiconductor industry. Canon Nanotechnologies systems feature its innovative Jet and Flash Imprint Lithography (J-FIL) technology to help create the sub-20nm required in today’s state-of-the-art semiconductor memory devices. (http://cnt.canon.com)

Location: Austin, TX, US

Posted Date: 4/30/2025